Inductively Coupled Plasma Mass Spectrometry
The Inductively Coupled Plasma Mass Spectrometry opens up a new dimension in ICP-MS, with 10x higher matrix tolerance, 10x wider dynamic range and 10x better signal to noise than the Inductively Coupled Plasma Mass Spectrometry, with software so powerful it can write your methods for you. The Inductively Coupled Plasma Mass Spectrometry includes the industry’s most effective helium collision mode for unsurpassed interference removal, ensuring superior data quality for any application.
Features of Inductively Coupled Plasma Mass Spectrometry
- Unprecedented matrix tolerance— Inductively Coupled Plasma Mass Spectrometry has a robust plasma and optional Ultra High Matrix Introduction (UHMI) technology that enable you to routinely measure samples containing up to 25% total dissolved solids (TDS)—100 times higher than the traditional matrix limit for ICP-MS, and far beyond the capability of any other current system.
- Widest dynamic range—the new orthogonal detector system (ODS) delivers up to 11 orders of magnitude dynamic range from sub-ppt to percent-level concentrations, enabling you to measure trace elements and majors in the same run.
- Better trace level detection—novel interface design and optimized expansion-stage vacuum system increase ion transmission, providing >109cps/ppm sensitivity at <2% CeO, while the ODS provides increased gain and reduced background for improved signal to noise.
- Faster analysis of transient signals—with 10,000 separate measurements per second, the Inductively Coupled Plasma Mass Spectrometry provides short integration times for accurate analysis of transient signals